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A microwave-induced plasma source: Characterization and application for the fast deposition of crystalline silicon films
Jia, Haijun, Kuraseko, Hiroshi, Kondo, MichioVolume:
103
Year:
2008
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2833339
File:
PDF, 890 KB
english, 2008