High Rate Reactive Sputter Deposition of TiO...

Japanese Journal of Applied Physics 2011 / 4 Vol. 50; Iss. 4

High Rate Reactive Sputter Deposition of TiO 2 Films for Photocatalyst and Dye-Sensitized Solar Cells

Sato, Yasushi, Hashimoto, Takahiro, Miyamura, Amica, Ohno, Singo, Oka, Nobuto, Suzuki, Koichi, Glöß, Daniel, Frach, Peter, Shigesato, Yuzo
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.045802
Date:
April, 2011
File:
PDF, 498 KB
english, 2011
Conversion to is in progress
Conversion to is failed