Photoresist Exposure Parameter Extraction from Refractive...

Japanese Journal of Applied Physics 1998 / 12 Vol. 37; Iss. Part 1, No

Photoresist Exposure Parameter Extraction from Refractive Index Change during Exposure

Sohn, Young-Soo, Sung, Moon-Gyu, Lee, Young-Mi, Lee, Eun-Mi, Oh, Jin-Kyung, Byun, Sung-Hwan, Jeong, Yeon-Un, Oh, Hye-Keun, An, Ilsin, Lee, Kun-Sang, Park, In-Ho, Cho, Joon-Yeon, Lee, Sang-Ho
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Volume:
37
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.37.6877
Date:
December, 1998
File:
PDF, 948 KB
1998
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