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Efficient Si Planar Doping in GaAs by Flow-Rate Modulation Epitaxy
Kobayashi, Naoki, Makimoto, Toshiki, Horikoshi, YoshijiVolume:
25
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.25.l746
Date:
September, 1986
File:
PDF, 530 KB
1986