Evaluating Photoresist Dissolution, Swelling, and Removal...

Journal of The Electrochemical Society 2005 Vol. 152; Iss. 1

Evaluating Photoresist Dissolution, Swelling, and Removal with an In Situ Film Refractive Index and Thickness Monitor

Spuller, M. T., Perchuk, R. S., Hess, D. W.
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Volume:
152
Year:
2005
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1817716
File:
PDF, 201 KB
english, 2005
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