Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2002 Vol. 20; Iss. 5
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Comparative study of SiOCH low-k films with varied porosity interacting with etching and cleaning plasma
D. Shamiryan, M. R. Baklanov, S. Vanhaelemeersch, K. MaexVolume:
20
Year:
2002
Language:
english
DOI:
10.1116/1.1502699
File:
PDF, 495 KB
english, 2002