A computational study of gas-phase and surface reactions in deposition and etching of GaAs and AlAs in the presence of HCl
Carlo Cavallotti, Istvan Lengyel, Maria Nemirovskaya, Klavs F. JensenVolume:
268
Year:
2004
Language:
english
Pages:
20
DOI:
10.1016/j.jcrysgro.2004.04.033
File:
PDF, 742 KB
english, 2004