Orientation selective epitaxial growth of CeO layers on Si(1 0 0) substrates using reactive DC magnetron sputtering with substrate bias
Tomoyasu Inoue, Masayuki Ohashi, Naomichi Sakamoto, Shigenari ShidaVolume:
271
Year:
2004
Language:
english
Pages:
8
DOI:
10.1016/j.jcrysgro.2004.07.052
File:
PDF, 424 KB
english, 2004