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FTIR analysis of a-SiC:H films grown by plasma enhanced CVD
Tsutomu Kaneko, Dai Nemoto, Atsushi Horiguchi, Nobuaki MiyakawaVolume:
275
Year:
2005
Language:
english
Pages:
1
DOI:
10.1016/j.jcrysgro.2004.11.128
File:
PDF, 232 KB
english, 2005