A numerical study on heat transfer and film growth rate of InP and GaAs MOCVD process
Ik-Tae Im, Masakazu Sugiyama, Yukihiro Shimogaki, Yoshiyaki NakanoVolume:
276
Year:
2005
Language:
english
Pages:
8
DOI:
10.1016/j.jcrysgro.2004.12.082
File:
PDF, 363 KB
english, 2005