Optimisation of low-temperature silicon epitaxy on seeded...

Optimisation of low-temperature silicon epitaxy on seeded glass substrates by ion-assisted deposition

Axel Straub, Daniel Inns, Mason L. Terry, Yidan Huang, Per I. Widenborg, Armin G. Aberle
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Volume:
280
Year:
2005
Language:
english
Pages:
16
DOI:
10.1016/j.jcrysgro.2005.04.011
File:
PDF, 468 KB
english, 2005
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