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Growth of multicrystalline Si with controlled grain boundary configuration by the floating zone technique
Masayuki Kitamura, Noritaka Usami, Takamasa Sugawara, Kenrato Kutsukake, Kozo Fujiwara, Yoshitaro Nose, Toetsu Shishido, Kazuo NakajimaVolume:
280
Year:
2005
Language:
english
Pages:
6
DOI:
10.1016/j.jcrysgro.2005.04.049
File:
PDF, 405 KB
english, 2005