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Growth kinetics study in halide chemical vapor deposition of SiC
S. Nigam, H.J. Chung, A.Y. Polyakov, M.A. Fanton, B.E. Weiland, D.W. Snyder, M. SkowronskiVolume:
284
Year:
2005
Language:
english
Pages:
11
DOI:
10.1016/j.jcrysgro.2005.06.027
File:
PDF, 322 KB
english, 2005