Growth kinetics study in halide chemical vapor deposition...

Growth kinetics study in halide chemical vapor deposition of SiC

S. Nigam, H.J. Chung, A.Y. Polyakov, M.A. Fanton, B.E. Weiland, D.W. Snyder, M. Skowronski
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Volume:
284
Year:
2005
Language:
english
Pages:
11
DOI:
10.1016/j.jcrysgro.2005.06.027
File:
PDF, 322 KB
english, 2005
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