Preparation and study of stoichiometric ZnO by MOCVD technique
Xinsheng Wang, Tianpeng Yang, Guotong Du, Hongwei Liang, Yuchun Chang, Weifeng Liu, Yibin XuVolume:
285
Year:
2005
Language:
english
Pages:
6
DOI:
10.1016/j.jcrysgro.2005.09.002
File:
PDF, 232 KB
english, 2005