![](/img/cover-not-exists.png)
Computation of three-dimensional flow and thermal fields in a model horizontal chemical vapor deposition reactor
T.S. Cheng, M.C. HsiaoVolume:
293
Year:
2006
Language:
english
Pages:
10
DOI:
10.1016/j.jcrysgro.2006.05.049
File:
PDF, 1.97 MB
english, 2006