X-ray diffraction analysis of an osmium silicide epilayer grown on Si(1 0 0) by molecular beam epitaxy
F.Z. Amir, R.J. Cottier, T.D. Golding, W. Donner, N. Anibou, D.W. StokesVolume:
294
Year:
2006
Language:
english
Pages:
5
DOI:
10.1016/j.jcrysgro.2006.06.017
File:
PDF, 282 KB
english, 2006