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Effect of N 2 -Gas Partial Pressure on the Structure and Properties of Copper Nitride Films by DC Reactive Magnetron Sputtering
Zuli, Liu, Xing'ao, Li, Anyou, Zuo, Zuobin, Yuan, Jianping, Yang, Kailun, YaoVolume:
9
Language:
english
Journal:
Plasma Science and Technology
DOI:
10.1088/1009-0630/9/2/06
Date:
April, 2007
File:
PDF, 311 KB
english, 2007