Growth optimization during III-nitride multiwafer MOVPE...

Journal of Crystal Growth 2007 Vol. 298; Iss. none

Growth optimization during III-nitride multiwafer MOVPE using real-time curvature, reflectance and true temperature measurements

F. Brunner, V. Hoffmann, A. Knauer, E. Steimetz, T. Schenk, J.-T. Zettler, M. Weyers
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Volume:
298
Year:
2007
Language:
english
Pages:
5
DOI:
10.1016/j.jcrysgro.2006.10.186
File:
PDF, 254 KB
english, 2007
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