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Influence of annealing temperature on passivation performance of thermal atomic layer deposition Al 2 O 3 films
Zhang, Xiang, Liu, Bang-Wu, Zhao, Yan, Li, Chao-Bo, Xia, YangVolume:
22
Language:
english
Journal:
Chinese Physics B
DOI:
10.1088/1674-1056/22/12/127303
Date:
December, 2013
File:
PDF, 1.30 MB
english, 2013