Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
1999 Vol. 17; Iss. 6
Inductively coupled plasma reactive ion etching of Al[sub x]Ga[sub 1−x]N for application in laser facet formation
F. A. Khan, L. Zhou, A. T. Ping, I. AdesidaVolume:
17
Year:
1999
Language:
english
DOI:
10.1116/1.591057
File:
PDF, 450 KB
english, 1999