Molecular Beam Epitaxial Growth of In x Ga 1- x As and In x Al 1- x As on Si Substrates
Fukunaga, Toshiaki, Hashimoto, Akihiro, Watanabe, NozomuVolume:
28
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.28.1276
Date:
July, 1989
File:
PDF, 732 KB
1989