Surface preparation of Si(1 0 0) by thermal oxide removal in a chemical vapor environment
Henning Döscher, Sebastian Brückner, Anja Dobrich, Christian Höhn, Peter Kleinschmidt, Thomas HannappelVolume:
315
Year:
2011
Language:
english
Pages:
6
DOI:
10.1016/j.jcrysgro.2010.07.017
File:
PDF, 505 KB
english, 2011