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Germanium doping for improved silicon substrates and devices
J. Vanhellemont, J. Chen, J. Lauwaert, H. Vrielinck, W. Xu, D. Yang, J.M. Rafí, H. Ohyama, E. SimoenVolume:
317
Year:
2011
Language:
english
Pages:
8
DOI:
10.1016/j.jcrysgro.2010.11.024
File:
PDF, 955 KB
english, 2011