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Numerical simulation on turbulent flows in vertical chemical vapor deposition reactors
Yan Tian, Chang-Feng Li, Hua-Hong Jiang, Hui Li, Ran ZuoVolume:
318
Year:
2011
Language:
english
Pages:
5
DOI:
10.1016/j.jcrysgro.2010.11.070
File:
PDF, 619 KB
english, 2011