Diagnostic of Surface Wave Plasma for Oxide Etching in...

Japanese Journal of Applied Physics 1999 / 9 Vol. 38; Iss. Part 1, No

Diagnostic of Surface Wave Plasma for Oxide Etching in Comparison with Inductive RF Plasma

Kokura, Hikaru, Yoneda, Shinichi, Nakamura, Keiji, Mitsuhira, Noriyuki, Nakamura, Moritaka, Sugai, Hideo
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Volume:
38
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.38.5256
Date:
September, 1999
File:
PDF, 458 KB
english, 1999
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