Role of atomic layer deposited aluminum oxide as oxidation barrier for silicon based materials
Fiorentino, Giuseppe, Morana, Bruno, Forte, Salvatore, Sarro, Pasqualina MariaVolume:
33
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4904208
Date:
January, 2015
File:
PDF, 2.97 MB
english, 2015