Ab Initio Study of Elementary Processes in...

Japanese Journal of Applied Physics 1990 / 7 Vol. 29; Iss. Part 2, No

Ab Initio Study of Elementary Processes in Silicon Homoepitaxy -- Adsorption and Diffusion on Si(001)

Miyazaki, Takehide, Hiramoto, Hisashi, Okazaki, Makoto
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Volume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L1165
Date:
July, 1990
File:
PDF, 693 KB
1990
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