Fabrication of GaAs Ultrafine Gratings by...

Japanese Journal of Applied Physics 1990 / 7 Vol. 29; Iss. Part 2, No

Fabrication of GaAs Ultrafine Gratings by Single-Layer-Masked SiCl 4 Reactive Ion Etching

Li, Guo Ping, Guo, Liang, Katoh, Takayuki, Nagamune, Yasushi, Fukatsu, Susumu, Shiraki, Yasuhiro, Ito, Ryoichi
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Volume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.29.l1213
Date:
July, 1990
File:
PDF, 1.03 MB
1990
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