Low Temperature Silicon Nitride and Silicon Dioxide Film...

Journal of The Electrochemical Society 2000 Vol. 147; Iss. 4

Low Temperature Silicon Nitride and Silicon Dioxide Film Processing by Inductively Coupled Plasma Chemical Vapor Deposition

Lee, J. W., Mackenzie, K. D., Johnson, D., Sasserath, J. N., Pearton, S. J., Ren, F.
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Volume:
147
Year:
2000
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1393382
File:
PDF, 549 KB
english, 2000
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