[IEEE 2004 IEEE/SEMI Advanced Semiconductor Manufacturing...

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[IEEE 2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - Boston, MA, USA (4-6 May 2004)] 2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (IEEE Cat. No.04CH37530) - Optimizing pattern fill for planarity and parasitic capacitance

Nelson, M., Williams, B., Belisle, C., Aytes, S., Beasterfield, D., Liu, J., Donaldson, S., Prasad, J.
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Year:
2004
Language:
english
DOI:
10.1109/asmc.2004.1309547
File:
PDF, 333 KB
english, 2004
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