Real-time characteristic impedance monitoring for end-point...

Japanese Journal of Applied Physics 2014 / 01 Vol. 53; Iss. 3S2

Real-time characteristic impedance monitoring for end-point and anomaly detection in the plasma etching process

Motomura, Taisei, Kasashima, Yuji, Uesugi, Fumihiko, Kurita, Hiroyuki, Kimura, Naoya
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Volume:
53
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.53.03DC03
Date:
January, 2014
File:
PDF, 594 KB
english, 2014
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