Atomic layer deposited high-κ nanolaminates for silicon...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2014 / 05 Vol. 32; Iss. 3

Atomic layer deposited high-κ nanolaminates for silicon surface passivation

Benner, Frank, Jordan, Paul M., Richter, Claudia, Simon, Daniel K., Dirnstorfer, Ingo, Knaut, Martin, Bartha, Johann W., Mikolajick, Thomas
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Volume:
32
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4863499
Date:
May, 2014
File:
PDF, 970 KB
english, 2014
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