Chlorine-Based Smooth Reactive Ion Beam Etching of Indium-Containing III-V Compound Semiconductor
Yoshikawa, Takashi, Kohmoto, Sigeru, Anan, Masami, Hamao, Noboru, Baba, Masakazu, Takado, Norikazu, Sugimoto, Yoshimasa, Sugimoto, Mitsunori, Asakawa, KiyoshiVolume:
31
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.31.4381
Date:
December, 1992
File:
PDF, 1.78 MB
1992