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Reflection High-Energy Electron Diffraction of Heteroepitaxy in Chemical Vapor Deposition Reactor: Atomic-Layer Epitaxy of GaAs, AlAs and GaP on Si
Kitahara, Kuninori, Ozeki, Masashi, Nakajima, KazuoVolume:
32
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.1051
Date:
March, 1993
File:
PDF, 1.19 MB
1993