Hard silicon carbonitride films obtained by RF-plasma-enhanced chemical vapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide
Yanping Zhou, Daniel Probst, Andreas Thissen, Edwin Kroke, Ralf Riedel, Ralf Hauser, Holger Hoche, Erhard Broszeit, Peter Kroll, Herbert StafastVolume:
26
Year:
2006
Language:
english
Pages:
11
DOI:
10.1016/j.jeurceramsoc.2005.02.004
File:
PDF, 1.33 MB
english, 2006