Influence of LaCl3concentration and annealing temperature...

Applied Nanoscience 2015 / 8 Vol. 5; Iss. 6

Influence of LaCl3concentration and annealing temperature on the diode ideality factor of LaF3/porous-silicon structure prepared by chemical bath deposition technique

Hafijur Rahman, Md., Ismail, Abu Bakar Md.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
5
Language:
english
Journal:
Applied Nanoscience
DOI:
10.1007/s13204-014-0358-6
Date:
August, 2015
File:
PDF, 647 KB
english, 2015
Conversion to is in progress
Conversion to is failed