![](/img/cover-not-exists.png)
Anisotropic Ridge Growth by Step-Flow-Mode Metalorganic Chemical Vapor Deposition Using Diethylgalliumchloride
Yamaguchi, Ko-ichi, Okamoto, KotaroVolume:
32
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.32.4885
Date:
November, 1993
File:
PDF, 1.04 MB
1993