Gap-Fill Process of Shallow Trench Isolation for 0.13 µm...

Japanese Journal of Applied Physics 2002 / 5 Vol. 41; Iss. Part 1, No

Gap-Fill Process of Shallow Trench Isolation for 0.13 µm Technologies

Nishimura, Hiroshi, Takagi, Shigeyuki, Fujino, Makoto, Nishi, Norio
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Volume:
41
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.41.2886
Date:
May, 2002
File:
PDF, 1.64 MB
english, 2002
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