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Growth Condition Dependence of Carbon Reduction in GaAs Chemical Beam Epitaxy Using Trisdimethylamino-Arsine and Trimethylgallium
Ishikura, Kouji, Takeuchi, Atsushi, Kurihara, Megumu, Machida, Hideaki, Hasegawa, FumioVolume:
33
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L494
Date:
April, 1994
File:
PDF, 538 KB
1994