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Method to Obtain Low-Dislocation-Density Regions by Patterning with $\bf SiO_{2}$ on GaAs/Si Followed by Annealing
Yamaichi, Eiji, Ueda, Takashi, Gao, Qingzhu, Yamagishi, Chouho, Akiyama, MasahiroVolume:
33
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.L1442
Date:
October, 1994
File:
PDF, 798 KB
1994