Metalorganic Chemical Vapor Deposition of AlGaAs Using...

Japanese Journal of Applied Physics 1995 / 12 Vol. 34; Iss. Part 1, No

Metalorganic Chemical Vapor Deposition of AlGaAs Using Tertiarybuthylarsine

Ishikawa, Hironori, Izumiya, Toshihide, Mashita, Masao
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Volume:
34
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.34.6377
Date:
December, 1995
File:
PDF, 325 KB
1995
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