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Selective Dry Etching of HfO 2 in CF 4 and Cl 2 /HBr-Based Chemistries
Maeda, Takeshi, Ito, Hiroyuki, Mitsuhashi, Riichiro, Horiuchi, Atsushi, Kawahara, Takaaki, Muto, Akiyoshi, Sasaki, Takaoki, Torii, Kazuyoshi, Kitajima, HiroshiVolume:
43
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.43.1864
Date:
April, 2004
File:
PDF, 119 KB
english, 2004