Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2012 Vol. 30; Iss. 1
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Role of ions, photons, and radicals in inducing plasma damage to ultra low-k dielectrics
H. Shi, H. Huang, J. Bao, J. Liu, P. S. Ho, Y. Zhou, J. T. Pender, M. D. Armacost, D. KyserVolume:
30
Year:
2012
Language:
english
DOI:
10.1116/1.3671008
File:
PDF, 1.55 MB
english, 2012