Investigation of interface quality and passivation improvement with a-SiO:H deposited by ECRCVD at low temperature
Chu, Yen-Ho, Lee, Chien-Chieh, Chang, Teng-Hsiang, Hsieh, Yu-Lin, Liu, Shian-Ming, Chang, Jenq-Yang, Li, Tomi T., Chen, I-ChenVolume:
412
Language:
english
Journal:
Journal of Non-Crystalline Solids
DOI:
10.1016/j.jnoncrysol.2014.12.032
Date:
March, 2015
File:
PDF, 1.57 MB
english, 2015