Photodegradation of nitrobenzene using 172 nm...

Journal of Hazardous Materials 2006 Vol. 133; Iss. 1-3

Photodegradation of nitrobenzene using 172 nm excimer UV lamp

Qian-Rong Li, Cheng-Zhi Gu, Yan Di, Hao Yin, Jun-Ying Zhang
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Volume:
133
Year:
2006
Language:
english
Pages:
7
DOI:
10.1016/j.jhazmat.2005.09.061
File:
PDF, 338 KB
english, 2006
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