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Realization of Highly Resistive GaAs/Si Interface and...

Realization of Highly Resistive GaAs/Si Interface and Improvement of RF Performance for High Electron-Mobility Transistors Grown on Si Substrates

Miyagaki, Shinji, Hara, Naoki, Harada, Naoki, Eshita, Takashi, Hikosaka, Kohki, Tanaka, Hitoshi
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Volume:
36
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.36.2022
Date:
April, 1997
File:
PDF, 880 KB
1997
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