Electroless Deposition of Thin-Film Cobalt-Tungsten-Phosphorus Layers Using Tungsten Phosphoric Acid (H[sub 3][P(W[sub 3]O[sub 10])[sub 4]]) for ULSI and MEMS Applications
Shacham-Diamand, Yosi, Sverdlov, Y., Petrov, N.Volume:
148
Year:
2001
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1346605
File:
PDF, 290 KB
english, 2001