Metallorganic Chemical Vapor Deposition of Ru Films Using...

Journal of The Electrochemical Society 2002 Vol. 149; Iss. 6

Metallorganic Chemical Vapor Deposition of Ru Films Using Cyclopentadienyl-Propylcyclopentadienylruthenium(II) and Oxygen

Kang, Sang Yeol, Lim, Ha Jin, Hwang, Cheol Seong, Kim, Hyeong Joon
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Volume:
149
Year:
2002
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1471547
File:
PDF, 719 KB
english, 2002
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