Optimizations of inductively coupled plasma etching and...

Modern Physics Letters B 2014 / 03 Vol. 28; Iss. 6

Optimizations of inductively coupled plasma etching and design for sensing window of Mach–Zehnder interferometer sensor in polymer technology

Yang, Tianfu, Wang, Tianjiao, Zheng, Chuantao, Wang, Xibin, Zhang, Daming
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Volume:
28
Language:
english
Journal:
Modern Physics Letters B
DOI:
10.1142/S0217984914500444
Date:
March, 2014
File:
PDF, 3.27 MB
english, 2014
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