Thermal Environment Prediction for Silicon Crystal Growth...

Japanese Journal of Applied Physics 1997 / 12 Vol. 36; Iss. Part 2, No

Thermal Environment Prediction for Silicon Crystal Growth of up to 16-inch Diameters in Czochralski Furnaces

Takano, Kiyotaka, Iida, Tetsuhiro, Kuramoto, Makoto, Machida, Norihisa, Matsubara, Junichi, Shiraishi, Yutaka, Takase, Nobumitsu, Yamagishi, Hirotoshi
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Volume:
36
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.36.L1563
Date:
December, 1997
File:
PDF, 333 KB
1997
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